Seminar « Introduction to ASML EUV lithography » by Lylia Kamelia Gheribes (ASML)

Eng. Lylia Kamelia Gheribes (ASML, The Netherlands) delivered a seminar at the University of Brescia on Thursday 06 June 2024 entitled « Introduction to ASML EUV lithography ».

Abstract. Lylia Kamelia Gheribes presented to the students her academic and life experience in EMIMEP. Then give an introduction to the main principles of EUV lithography at ASML. EUV lithography does big things on a tiny scaleThe technology, which is unique to ASML, prints microchips using light with a wavelength of just 13.5 nm – almost x-ray range. EUV is driving Moore’s Law forward and supporting novel transistor designs and chip architectures.

She also introduced the career opportunities at ASML, a Dutch multinational corporation founded in 1984. ASML specializes in the development and manufacturing of photolithography machines which are used to produce computer chips. As of 2023 it is the largest supplier for the semiconductor industry and the sole supplier in the world of extreme ultraviolet lithography (EUVL) photolithography machines that are required to manufacture the most advanced chips.

Biography. Intake 2 EMIMEO student alumna, currently Lithography system performance generalist at ASML, main topics covered are Imaging, Overlay, Focus and Productivity performance of EUV systems, focus on High NA lithography. Planning a long term assignment of 2 years in South Korea starting from Jan 2025, to support the integration of the EXE5000 system at the customer site Samsung.